cover

Experimental and Theoretical NANOTECHNOLOGY

About the Journal :

Experimental and Theoretical NANOTECHNOLOGY (ETN) is a multidisciplinary peer-reviewed international journal published four issues a year. It includes specialized research papers, short communications, reviews and selected conference papers in special issues on the characterization, synthesis, processing, structure and properties of different principles and applications of NANOTECHNOLOGY; with focus on advantageous achievements and applications for the specialists in engineering, chemistry, physics and materials science.

ETN covers and publishes all aspects of fundamental and applied researches of experimental and theoretical nanoscale technology dealing with materials synthesis, processing, nanofabrication, nanoprobes, spectroscopy, properties, biological systems, nanostructures, nanoelectronics, nano-optics, nano-mechanics, nanodevices, nanobiotechnology, nanomedicine, nanotoxicology within the scope of the journal. ETN aims to acquire the recent and outstanding researches for the benefit of the human being.



ANALYTICAL STUDIES OF ELECTROHYDRODYNAMICALLY TIO2 NANOSTRUCTURE

In this paper, we report an alternate technique for the deposition of nanostructured TiO2 thin films using theelectrohydrodynamicatomization(EHDA)techniqueus- ingpolyvinylpyrrolidone(PVP)asastabilizer.Therequired parameters for achieving uniform TiO2 films using EHDA are also discussed in detail. X-ray diffraction results con- firm that the TiO2 films were oriented in the anatase phase. Scanning electron microscope studies revealed the uniform deposition of the TiO2. The purity of the films is charac- terized by using Fourier transform infrared (FTIR) spec- troscopyandX-rayphotoelectronspectroscopy(XPS),con- firming the presence of Ti–O bonding in the films without anyorganicresidue.TheopticalpropertiesoftheTiO2films were measured by UV-visible spectroscopy, which shows that the transparency of the films is nearly 85% in the visi- bleregion.Thecurrent–voltage(IV)curveoftheTiO2thin filmsshowsanearlylinearbehaviorwith45mQcmofelec- trical resistivity. These results suggest that TiO2 thin films depositedviatheEHDAmethodpossesspromisingapplications in optoelectronicdevices.

Keywords:TiO2; Analysis; Optical.